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2019 №04 (02) DOI of Article
2019 №04 (04)

Electrometallurgy Today 2019 #04
SEM, 2019, #4, 18-25 pages

Journal                    SEM
Publisher                International Association «Welding»
ISSN                      2415-8445 (print)
Issue                       № 4, 2019 (November)
Pages                      18-25

Hybrid systems for electron beam evaporation and ion sputtering

A.I. Kuzmichev1, A.I. Ustinov2, A.E. Rudenko2, I.M. Drozd1
1NTTU «Igor Sikorsky KPI». 37 Pobedi Prosp., 03506, Kyiv, Ukraine. E-mail: kuzmichev-kpi@ukr.net
2E.O. Paton Electric Welding Institute of the NAS of Ukraine. 11 Kazymyr Malevych Str., 03150, Kyiv, Ukraine. E-mail: office@paton.kiev.ua

Hybrid systems for electron beam evaporation with ion-assisted process of evaporated substance condensation in the form of coating are considered. A system is presented, in which argon ions were generated by a magnetron discharge, induced around a rod-like substrate which served as a cathode for this discharge. The objective of ion assisting is sputtering of the substrate surface for finish cleaning before coating deposition and bombardment by condensate ions during deposition to provide an ion-kinetic impact on the coating structure. The process of deposition of damping MgO–Cr–Sn coating on titanium substrate was realized by applying the method of electron beam evaporation of the substrate with argon ion assisting under the conditions of relatively low temperatures (200 °C). Ref. 8, Fig. 9.
Key words: electron beam evaporation; ions; assisting; bombardment; magnetron discharge; damping coatings; condensate; deposition; substrate
Received:                30.10.19
Published:               23.09.19


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